cov
Hauv kev lag luam ntawm semiconductor manufacturing, raws li cov khoom siv tseem ceeb uas txiav txim siab qhov tseeb ntawm cov txheej txheem kev tsim khoom, kev ruaj ntseg ntawm ib puag ncig sab hauv ntawm lub tshuab photolithography yog qhov tseem ceeb heev. Los ntawm excitation ntawm huab ultraviolet lub teeb qhov chaw mus rau lub lag luam ntawm nanoscale precision motion platform, yuav tsis muaj slightest deviation nyob rau hauv txhua qhov txuas. Granite hauv paus, nrog rau cov khoom tshwj xeeb, ua kom pom qhov zoo sib xws hauv kev ua haujlwm ruaj khov ntawm cov tshuab photolithography thiab txhim kho qhov tseeb photolithography. cov
Qhov zoo tshaj plaws electromagnetic shielding kev ua tau zoo
Sab hauv ntawm lub tshuab photolithography yog sau nrog ib puag ncig electromagnetic complex. Electromagnetic cuam tshuam (EMI) tsim los ntawm cov khoom xws li cov khoom siv hluav taws xob ultraviolet, tsav lub cev muaj zog, thiab cov khoom siv hluav taws xob ntau zaus, yog tias tsis tswj tau zoo, yuav cuam tshuam rau kev ua tau zoo ntawm cov khoom siv hluav taws xob thiab cov khoom siv kho qhov muag. Piv txwv li, kev cuam tshuam yuav ua rau me ntsis sib txawv hauv cov qauv photolithography. Hauv cov txheej txheem tsim khoom siab heev, qhov no yog qhov txaus los ua rau kev sib txuas ntawm transistor tsis raug ntawm cov nti, txo cov nti tawm los. cov
Granite yog cov khoom siv tsis yog hlau thiab tsis ua hluav taws xob los ntawm nws tus kheej. Tsis muaj qhov tshwm sim ntawm electromagnetic induction tshwm sim los ntawm kev txav ntawm cov hluav taws xob dawb sab hauv xws li cov khoom siv hlau. Cov yam ntxwv no ua rau nws lub cev tiv thaiv hluav taws xob tiv thaiv hluav taws xob, uas tuaj yeem cuam tshuam txoj kev sib kis ntawm sab hauv electromagnetic cuam tshuam. Thaum lub chaw sib nqus sib nqus tsim los ntawm cov khoom siv hluav taws xob sab nraud cuam tshuam rau hauv granite puag, vim granite tsis muaj hlau nplaum thiab tsis tuaj yeem sib nqus, qhov chaw sib nqus sib nqus yog qhov nyuaj rau nkag mus, yog li tiv thaiv cov khoom tseem ceeb ntawm lub tshuab photolithography ntsia rau ntawm lub hauv paus, xws li precision sensors thiab optical lens hloov kho cov cuab yeej, los ntawm kev cuam tshuam ntawm cov qauv thiab cov electromagnetic hloov. txheej txheem photolithography. cov
Zoo heev nqus compatibility
Vim tias ultraviolet lub teeb (EUV) tau yooj yim nqus los ntawm txhua yam khoom, suav nrog huab cua, EUV lithography tshuab yuav tsum ua haujlwm hauv lub tshuab nqus tsev. Hauv qhov no, kev sib raug zoo ntawm cov khoom siv nrog lub tshuab nqus tsev yog qhov tseem ceeb heev. Nyob rau hauv lub tshuab nqus tsev, cov ntaub ntawv yuav yaj, desorb thiab tso pa roj. Cov roj tso tawm tsis tsuas yog nqus EUV lub teeb, txo qhov kev siv zog thiab kev sib kis ntawm lub teeb, tab sis kuj tuaj yeem ua rau lub teeb pom kev zoo. Piv txwv li, dej vapor tuaj yeem oxidize lub lo ntsiab muag, thiab hydrocarbons tuaj yeem tso cov pa roj carbon monoxide rau ntawm lo ntsiab muag, cuam tshuam rau qhov zoo ntawm lithography. cov
Granite muaj cov khoom siv tshuaj ruaj khov thiab tsis tshua tso pa tawm hauv lub tshuab nqus tsev. Raws li kev soj ntsuam, nyob rau hauv ib tug simulated photolithography tshuab nqus tsev ib puag ncig (xws li lub ultra-huv lub nqus tsev ib puag ncig nyob rau hauv uas lub illumination optical system thiab imaging optical system nyob rau hauv lub ntsiab chamber nyob, yuav tsum tau H₂O < 10⁻⁵ Pa, CₓHᵧ < 10 ⁻ ⁷ , qhov qis tshaj ntawm granite yog qhov qis dua. uas yog lwm yam ntaub ntawv xws li hlau. Qhov no ua rau sab hauv ntawm lub tshuab photolithography kom tswj tau lub tshuab nqus tsev siab thiab kev huv huv rau lub sijhawm ntev, ua kom lub siab xa hluav taws xob ntawm EUV lub teeb thaum kis tau tus mob thiab qhov chaw siv ultra-ntxuav rau cov lo ntsiab muag kho qhov muag, txuas ntxiv lub neej kev pab cuam ntawm lub tshuab kho qhov muag, thiab txhim kho tag nrho cov kev ua tau zoo ntawm lub tshuab photolithography. cov
Muaj zog vibration kuj thiab thermal stability
Thaum lub sijhawm txheej txheem photolithography, qhov tseeb ntawm qib nanometer xav kom lub tshuab photolithography yuav tsum tsis muaj kev vibration me ntsis lossis thermal deformation. Ib puag ncig kev vibrations tsim los ntawm kev ua haujlwm ntawm lwm yam khoom siv thiab cov neeg ua haujlwm txav hauv kev cob qhia, nrog rau cov cua sov uas tsim los ntawm lub tshuab photolithography nws tus kheej thaum lub sijhawm ua haujlwm, txhua tus tuaj yeem cuam tshuam nrog qhov tseeb ntawm photolithography. Granite muaj qhov ntom ntom ntom thiab ib qho kev siv tawv, thiab nws muaj kev lom zem zoo heev. Nws sab hauv pob zeb siv lead ua qauv yog compact, uas muaj peev xwm ua tau zoo attenuate vibration zog thiab ceev ceev ceev kev co propagation. Kev sim cov ntaub ntawv qhia tias nyob rau hauv tib qhov kev co, lub hauv paus granite tuaj yeem txo qhov kev vibration amplitude los ntawm ntau tshaj 90% hauv 0.5 vib nas this. Piv nrog rau lub hauv paus hlau, nws tuaj yeem kho cov cuab yeej kom ruaj khov sai dua, ua kom cov txheeb ze txheeb ze ntawm lub lens photolithography thiab wafer, thiab zam cov qauv blurring lossis misalignment los ntawm kev co. cov
Lub caij no, cov coefficient ntawm thermal expansion ntawm granite yog tsawg heev, kwv yees li (4-8) × 10⁻⁶ / ℃, uas yog qis dua li cov khoom siv hlau. Thaum lub sijhawm ua haujlwm ntawm lub tshuab photolithography, txawm hais tias qhov kub thiab txias nyob rau hauv qhov hloov pauv vim yog vim li cas xws li kev tsim hluav taws xob los ntawm lub teeb ci thiab kev sib txhuam los ntawm cov khoom siv kho tshuab, lub hauv paus granite tuaj yeem tuav qhov kev ruaj ntseg thiab yuav tsis muaj qhov cuam tshuam loj vim thermal expansion thiab contraction. Nws muab kev txhawb nqa ruaj khov thiab txhim khu kev qha rau cov kab ke kho qhov muag thiab qhov tseeb txav platform, tswj xyuas qhov sib xws ntawm photolithography raug.
Post lub sij hawm: May-20-2025