Decrypt lub "pob zeb quab yuam" tom qab semiconductor manufacturing - Yuav ua li cas granite precision Cheebtsam reshape lub precision ciam teb ntawm nti manufacturing

Lub Precision Revolution nyob rau hauv semiconductor manufacturing: Thaum granite ntsib micron technology
1.1 Kev tshawb pom tsis tau pom hauv cov ntaub ntawv tshawb fawb
Raws li 2023 SEMI International Semiconductor Association tsab ntawv ceeb toom, 63% ntawm lub ntiaj teb no siab heev fabs tau pib siv granite bases es tsis txhob ntawm tsoos hlau platforms. Lub pob zeb ntuj no, uas yog los ntawm magma condensation tob hauv lub ntiaj teb, yog rov sau keeb kwm ntawm kev tsim khoom semiconductor vim nws lub cev tshwj xeeb:

Thermal inertia kom zoo dua: lub thermal expansion coefficient ntawm granite 4.5 × 10⁻⁶ / ℃ tsuas yog 1/5 ntawm stainless hlau, thiab qhov seem stability ntawm ± 0.001mm yog khaws cia nyob rau hauv tas li ntawd mus ua hauj lwm ntawm lub lithography tshuab.

Vibration damping yam ntxwv: sab hauv kev sib txhuam coefficient yog 15 npaug siab dua li cov hlau cam khwb cia, zoo absorbing cov cuab yeej micro-vibration

Zero magnetization xwm: tshem tawm tag nrho cov magnetic yuam kev hauv laser ntsuas

1.2 Lub metamorphosis taug kev ntawm kuv mus rau fab
Noj ZHHIMG lub hauv paus tsim khoom ntse hauv Shandong ua piv txwv, ib daim ntawm granite yuav tsum tau ua:

Ultra-precision machining: tsib-axis txuas machining chaw rau 200 xuab moos ntawm kev sib tsoo tas mus li, nto roughness txog Ra0.008μm

Artificial aging kho: 48 teev ntawm kev ntxhov siab ntuj tso tawm hauv qhov chaw ua haujlwm kub thiab av noo, uas txhim kho qhov ruaj khov ntawm cov khoom los ntawm 40%
Thib ob, tawg rau qhov teeb meem precision ntawm semiconductor manufacturing "pob zeb tov"
2.1 Wafer fragmentation tus nqi txo cov txheej txheem

Cov ntaub ntawv ua qauv qhia: Tom qab lub chip foundry nyob rau hauv lub teb chaws Yelemees txais peb cov roj ntab granite platform:

Wafer txoj kab uas hla

chip tus nqi txo

kev txhim kho flatness

12 ntiv

67%

≤0.001 hli

18 ntiv

82%

≤0.0005 hli

2.2 Lithographic alignment precision breakthrough scheme

Kub them nyiaj system: embedded ceramic sensor saib xyuas cov duab sib txawv hauv lub sijhawm tiag tiag thiab tuaj yeem kho lub platform inclination
Kev ntsuas cov ntaub ntawv: nyob rau hauv qhov kev hloov pauv ntawm 28 ℃ ± 5 ℃, qhov tseeb qhov tseeb hloov pauv tsawg dua 0.12μm

precision granite 10


Post lub sij hawm: Mar-24-2025